Symmetric type refractive and reflective optical system

一种对称式折反射光学系统

Abstract

The invention provides a symmetric type refractive and reflective optical system which is used for photoetching exposure system. The symmetric type refractive and reflective optical system comprises an object plane, a first reflector, a first lens set, a diaphragm, a second lens set, a second reflector and an image plane in sequence along the transmission direction of rays. All optical elements are in an identical optical axis, and the optical system parts in front of and behind the diaphragm are symmetric relative to the diaphragm. The symmetric type refractive and reflective optical system with a large field of view is one-time refractive and reflective projection objective which meets a g-line, an h-line and an i-line and is double telecentric symmetric type, and meets practical product requirements. Due to symmetric design, vertical axis aberration, coma, distortion and the chromatic difference of magnification can be small. The retractor set used for complement is arranged nearby the diaphragm between the two main reflectors, and therefore the caliber of a refraction element is effectively reduced, the ratio of the caliber of the refraction element and the field of view is almost 1:2, and accordingly cost and processing difficulty are effectively controlled.
本发明提出一种大视场的对称式折反射光学系统,用于光刻曝光系统,沿光线传播方向依次包括:物面;第一反射镜;第一透镜组;一光阑;第二透镜组;第二反射镜;像面;其中,所述各光学元件在同一光轴上,且光阑前、后的光学系统相对于光阑对称。本发明的大视场对称式折反射光学系统,是满足ghi三线,双远心对称式的1倍折反射式投影物镜,满足实际产品需求。同时由于采用对称式设计,垂轴像差,慧差,畸变,倍率色差将会很小;用于补偿的折射镜组位于两主反射镜中间的光阑附近,所以有效减小了折射元件的口径,折射元件的口径和视场的比值做到了将近1:2,从而有效地控制了成本和加工难度。

Claims

Description

Topics

Download Full PDF Version (Non-Commercial Use)

Patent Citations (4)

    Publication numberPublication dateAssigneeTitle
    CN-101216597-AJuly 09, 2008上海微电子装备有限公司Refraction and reflection projection optical system
    CN-101995775-AMarch 30, 2011佳能株式会社Exposure apparatus and device manufacturing method
    CN-1447927-AOctober 08, 2003多频道仪器公司Imaging system comprising concave mirror
    EP-2177934-A1April 21, 2010Carl Zeiss SMT AGKatadioptrisches Projektionsobjektiv mit hoher Transmission und hoher Apertur sowie Projektionsbelichtungsvorrichtung

NO-Patent Citations (0)

    Title

Cited By (0)

    Publication numberPublication dateAssigneeTitle